Front Cover; Fine Line Lithography; Copyright Page; Introduction to the series; Preface to volume 1; Advisory board; Table of Contents; Chapter 1. Fundamentals of electron and X-ray lithography; 1. Introduction; 2. Radiation-sensitive resists; 3. Electron scattering; 4. Electron-beam lithography; 5. X-ray lithography; Acknowledgements; References; Chapter 2. Optical methods for fine line lithography; 1. Contact and proximity printing; 2. Projection printing; 3. Deep-UV lithography; 4. Special techniques; 5. Conclusion; Acknowledgements; References

Chapter 3. Electron beam projection techniques1. Introduction, projection systems, general aspects; 2. (1:1) electron image projection systems; 3. Shadow printing with electrons and ions; 4. Demagnifying electron beam projection systems; 5. Demagnifying electron beam projection systems with photocathodes; 6. Critique and outlook; Acknowledgements; References; Chapter 4. Dry processing methods; 1. Introduction; 2. Reactive plasma etching; 3. Ion beam etching; 4. Lift-off techniques; 5. Summary; Acknowledgements; References

Chapter 5. Application of electron beam technology to large scale integrated circuits1. Introduction; 2. Types of systems; 3. Factors affecting system performance; 4. Actual systems; 5. Summary; References; Subject index