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Plasma deposition of amorphous silicon-based materials
Title:
Plasma deposition of amorphous silicon-based materials
Author:
Bruno, Giovanni.
ISBN:
9780080539102
9781281054104
Publication Information:
Boston : Academic Press, ©1995.
Physical Description:
1 online resource (xi, 324 pages) : illustrations.
Series:
Plasma--materials interactions
Plasma--materials interactions.
Contents:
Front Cover; Plasma Deposition of Amorphous Silicon-Based Materials; Copyright Page; Contents; Contributors; Preface; Chapter 1. Chemistry of Amorphous Silicon Deposition Processes: Fundamentals and Controversial Aspects; Chapter 2. Diagnostics of Amorphous Silicon (a-Si) Plasma Processes; Chapter 3. Deposition Conditions and the Optoelectronic Properties of a-Si:H Alloys; Chapter 4. Reactor Design for a-Si:H Deposition; Chapter 5. Optoelectronic Properties of Amorphous Silicon Using the Plasma- Enhanced Chemical Vapor Deposition (PECVD) Technique; Chapter 6. Amorphous-Silicon-Based Devices.
Abstract:
Semiconductors made from amorphous silicon have recently become important for their commercial applications in optical and electronic devices including FAX machines, solar cells, and liquid crystal displays. Plasma Deposition of Amorphous Silicon-Based Materials is a timely, comprehensive reference book written by leading authorities in the field. This volume links the fundamental growth kinetics involving complex plasma chemistry with the resulting semiconductor film properties and the subsequent effect on the performance of the electronic devices produced.
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Electronic Access:
ScienceDirect http://www.sciencedirect.com/science/book/9780121379407Available:*
Shelf Number | Item Barcode | Shelf Location | Status |
|---|---|---|---|
| TK7871.99 .A45 P55 1995 EB | 1184780-1001 | Elsevier E-Book Collections | Searching... |
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