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by
Karri, Naveen Kishore, author. (orcid)0000-0002-7381-9047
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materials based on the common practice in the ceramics industry which considers the statistical nature of
by
Mukherjee, Saptarshi, author.
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because of the ability of microwaves to propagate through and interact with these materials. The scattered
by
Cheng, Lin, author.
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different mask materials (ITO and Shipley 1818 photo-resist) were compared. The effects of RF power, DC bias
by
Zeppettella, David L., author.
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structural integration perspective and is unacceptable at UHF frequencies. While RF absorbing materials have

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