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1990
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      Cover image for Fundamentals and applications of ternary diffusion : proceedings of the International Symposium on Advances in Ternary Diffusion, Hamilton, Ontario, Canada, August 27-28, 1990
      1. 
      Fundamentals and applications of ternary diffusion : proceedings of the International Symposium on Advances in Ternary Diffusion, Hamilton, Ontario, Canada, August 27-28, 1990
      by 
      International Symposium on Advances in Ternary Diffusion (1990 : Hamilton, Ont.)
      ScienceDirect http://www.sciencedirect.com/science/book/9780080404127
      Format: 
      Excerpt: 
      -Doped Semiconductor; Defect Diffusion Kinetics; Consequences of Defect Pairing; Diffusion in the Presence of Pairing