Handbook of physical vapor deposition (PVD) processing : film formation, adhesion, surface preparation and contamination control
Başlık:
Handbook of physical vapor deposition (PVD) processing : film formation, adhesion, surface preparation and contamination control
Yazar:
Mattox, D. M.
ISBN:
9781591240792
9780815514220
Yazar Ek Girişi:
Yayın Bilgileri:
Westwood, N.J. : Noyes Publications, ©1998.
Fiziksel Tanımlama:
1 online resource (xxvii, 917 pages) : illustrations
Seri:
Knovel Library.
İçerik:
Introduction -- Substrate (""Real"") Surfaces and Surface Modification -- The Low-Pressure Gas and Vacuum Processing Environment -- The Low-Pressure Plasma Processing Environment -- Vacuum Evaporation and Vacuum Deposition -- Physical Sputtering and Sputter Deposition (Sputtering) -- Arc Vapor Deposition -- Ion Plating and Ion Beam Assisted Deposition -- Atomistic Film Growth and Some Growth-Related Film Properties -- Film Characterization and Some Basic Film Properties -- Addhesion and Deadhesion -- Cleaning -- External Processing Environment -- APPENDIX 1: Reference Material -- APPENDIX 2: Transfer of Technology from R & D to Manufacturing -- Glossary of Terms and Acronyms Used in Surface Engineering.
Özet:
Covers aspects of the Physical Vapor Deposition process technology from characterizing and preparing the substrate material, through deposition processing and film characterization, to post-deposition processing. Includes subjects such as substrate characterization, adhesion, cleaning, and processing. Also covers the more widely discussed subjects of vacuum technology and the fundamentals of individual deposition processes.
Elektronik Erişim:
ScienceDirect http://www.sciencedirect.com/science/book/9780815514220Mevcut:*
Yer Numarası | Demirbaş Numarası | Shelf Location | Lokasyon / Statüsü / İade Tarihi |
---|---|---|---|
TS695 .M38 1998 EB | 1189939-1001 | Elsevier E-Kitap Koleksiyonu | Arıyor... |
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